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| Categories | Inline Chemical Heater |
|---|---|
| Brand Name: | Precise Heater |
| Model Number: | UH202 |
| Certification: | CSA,UL,CE |
| Place of Origin: | China |
| MOQ: | 1 unit |
| Price: | US$3,000 - 9,000 / unit |
| Payment Terms: | L/C, D/A, D/P, T/T, Western Union, MoneyGram |
| Supply Ability: | 30 units per month |
| Delivery Time: | 15-25 days |
| Packaging Details: | Export Wooden Case |
| Material: | PFA/PTFE/PVDF |
| Color: | White |
| Safety Features: | Liquid level sensor,Ground wire options |
| Applications: | Semiconductor Wet Processes,Solar/Photovoltaic Wafer Cleaning |
| SPECIFICATIONS: | 1,000 watts up to 18,000 watts |
| Voltages: | 110 to 600 volts, single or three phase |
Inline Chemical Heater Performs Unmatched Semiconductor Process Fluid Heating
Now heat semiconductor process fluids up to 210°C!
Faster heatup: Single heater chamber sizes up to 18kW.
Rapid installation: Customized plumbing connections
Long heater life for reduced cost of ownership (COO):
Patented heater gas purge system continuously removes any chemical permeation and ensures long element life.
Long heater life and clean operating: Patented heater gas purge system continuously removes chemical permeation and ensures exceptionally long element life. This system also protects against any potential ionic contamination of the chemistry.
Rugged construction: Thick walled chamber provides long service life in the harshest high temperature applications.
Exceptionally clean performance: Thick fluoropolymersheath minimizes permeation. Element purge monitoring minimizes ionic contamination potential. Cleanroom assembly and testing ensures the highest manufacturing standards.
Outstanding chemical compatibility: All fluoropolymerwetted parts compatible with virtually any chemistry.
Excellent temperature stability: Low watt density design enables accurate control of process temperature.
Applications Include:
SC1: ammonium hydroxide (NH4OH), and hydrogen peroxide (H2O2)
SC2: hydrochlorice acid (HCl) and hydrogen peroxide Buffered oxide
etch (BOE) process: hydrofluoric acid (HF) and ammonim fluoride
(NH4F)
Nitride etch/strip: phosphoric acid (H3PO4)Various acids such as:
Hydrochloric (HCl)
Hydrofluoric (HF)
Acetic (C2H4O2)
Nitric (HNO3)
Sulfuric (H2SO4)
Sulfuric acid and hydrogen peroxide
Sulfuric acid and ozone (O3)
Hydrofluoric acid and glycol (C2H6O2)
Potassium hydroxide (KOH)
Sodium hydroxide (NaOH)
Electroless nickel Electroless copper Electroless gold Deionized water
Some solvents (consult factory)
Benefits and Specifications
Unmatched heating of semiconductor process fluids upto 210°C.
Patented heater gas purge system ensures long element life and reduced cost of ownership.
Thick walled chamber provides long service life in the harshest high temperature applications.
Element purge monitoring minimizes ionic contamination potential. Cleanroom assembly and testing ensures the highest manufacturing standards.
All fluoropolymer wetted parts provide outstandingcompatibility with virtually any chemistry.
Low watt density design enables precise and stable control of process temperature.
PVDF high temperature mounting brackets (Hightemperature model)
Options:
Horizontally mounted configuration
Integral cooling coils
100 ohm RTDs or “J”, “K”, or “E” type process and
element thermocouples
Lower watt density heaters for special applications
Specifications:
Service:
• Inline chemical heater with all fluoropolymer wetted
surfaces for virtually any wet chemistry application.
Temperature Range: Up to 210°C.
Maximum Working Pressure:
• 100 PSIG (7 Bar) at 25oC
• 43 PSIG (. Bar) at 180oC
Heater Sizes: 1,000 watts up to 18,000 watts
Heater Voltages Available:
• 200 to 600 volts, single or three phase (12kW and
larger requires three phase).
Watt Density: 10 watts per square inch (1.5w/cm2)
Fluid Connections Available:
• 1⁄4” (6mm) to 1” (25mm) flared
• 1⁄2” (12mm) to 1” (25mm) Super 300 Type Pillar®•
Other connections available, consult factory
Third Party Certificatons: CE, UL, Semi S2 and S3
Element Purge:
• Small amount of clean dry air (CDA) or N2 gas flows
between the metal grounded element and the PTFE sheath
Applications
Semiconductor Wet Processes
Sterilization/Cleaning
Solar/Photovoltaic Wafer Cleaning
Liquid level sensor
Ground wire options
Over-temperature thermocouple
Process thermocouple
Options
Thermal cutoff
Thermocouples
Fiber-optic liquid level sensor
RTD sensors
Pressure relief valve
Model | LP1 | LP7 |
Wetted Material | PVDF/PFA | PVDF/PFA |
Housing Material | Pipe | Pipe |
Max Temp | 95°C | 95°C |
Pressure | 60 psi at 95°C | 60 psi at 95°C |
Power* | 1-15 kW | 1-18 kW |
Accuracy | ± 0.1o C | ± 0.1o C |
Voltages** | 200-480 VAC, 1 and 3-phase | 200-600 VAC, 1 and 3-phase |
Flow | 0.5-32 gpm (1.9-122 L/min) | 0.5-32 gpm (1.9-122 L/min) |
Benefits | Variable height | Higher flow, kW |
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